共 9 条
[2]
Eley D. D., 1986, ADV CATAL, V34, P206
[3]
ELECTRONIC-PROPERTIES OF THE INTERFACE BETWEEN SI AND TIO2 DEPOSITED AT VERY LOW-TEMPERATURES
[J].
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS,
1986, 25 (09)
:1288-1291
[4]
Titanium oxide films on Si(100) deposited by electron-beam evaporation at 250°C
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS,
2000, 18 (03)
:917-921
[7]
Investigation of nano-size TiO2 powders:: Structure and particle size aspects
[J].
FUNCTIONALLY GRADED MATERIALS VIII,
2005, 492-493
:593-598