INTERRELATIONSHIPS BETWEEN PROCESS PARAMETERS, STRUCTURE, AND PROPERTIES OF CVD TUNGSTEN AND TUNGSTEN-RHENIUM ALLOYS

被引:38
作者
HOLMAN, WR [1 ]
HUEGEL, FJ [1 ]
机构
[1] UNIV CALIF,LAWRENCE LIVERMORE LAB,LIVERMORE,CA 94550
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1974年 / 11卷 / 04期
关键词
D O I
10.1116/1.1312739
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:701 / 708
页数:8
相关论文
共 20 条
[1]   VAPOR DEPOSITION OF TUNGSTEN BY HYDROGEN REDUCTION OF TUNGSTEN HEXAFLUORIDE - PROCESS VARIABLES AND PROPERTIES OF DEPOSIT [J].
BERKELEY, JF ;
BRENNER, A ;
REID, WE .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1967, 114 (06) :561-&
[2]  
BRECHER LE, 1973, 4TH P INT C CHEM VAP, P340
[3]  
CHEUNG H, 1972, 3RD P INT C CHEM VAP, P136
[4]  
GEUS JW, 1971, CHEMISORPTION REACTI, pCH3
[5]  
GLASKI FA, 1970, 2 INT C CVD LOS ANG, P839
[6]  
GREEN JM, 1972, Patent No. 3661636
[7]  
HASKELL RW, 1970, 2ND P INT C CHEM VAP, P63
[8]   TENSILE TEST APPARATUS FOR SMALL RING SPECIMENS [J].
HOLMAN, WR ;
STILES, EB ;
FUNG, E .
JOURNAL OF SCIENTIFIC INSTRUMENTS, 1967, 44 (07) :545-&
[9]  
HOLMAN WR, 1971, 2 P INT C CHEM VAP D, P171
[10]  
HOLMAN WR, 1967, P C CHEM VAP DEP REF, P427