THIN-FILM STUDIES OF REDUCTION OF SIO2 BY AL

被引：25

作者：

PRABRIPUTALOONG, K ^{[1
]}

PIGGOTT, MR ^{[1
]}

机构：

[1] UNIV TORONTO, DEPT CHEM ENGN, TORONTO, ONTARIO, CANADA

来源：

关键词：

D O I：

10.1111/j.1151-2916.1973.tb12449.x

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：177 / 180

页数：4

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