INHIBITION OF SUPERCONDUCTIVITY IN YBACUO FILMS BY ALUMINUM ION-IMPLANTATION

被引：6

作者：

HONG, SH ^{[1
]}

MILLER, JR ^{[1
]}

MA, QY ^{[1
]}

YANG, ES ^{[1
]}

LUKE, GM ^{[1
]}

机构：

[1] COLUMBIA UNIV,DEPT PHYS,NEW YORK,NY 10027

来源：

APPLIED PHYSICS LETTERS | 1995年 / 67卷 / 18期

关键词：

D O I：

10.1063/1.114303

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

We have studied the inhibition of superconductivity in high-temperature superconductors oxide films by aluminum ion implantation. Aluminum ions, with doses ranging from 1 X 10(15)-1 X 10(16)/cm(2), were implanted into epitaxial YBa2Cu3O7-x (YBCO) films with an injection energy of 100 keV. Doses of 1 X 10(16)/cm(2) completely suppressed the diamagnetism of the YBCO film without the need for annealing. Lower doses of 1 X 10(15)/cm(2) inhibited the superconductivity after low-temperature annealing. The results of the aluminum implantation are compared with previous silicon and baron implantations. (C) 1995 American Institute of Physics.

引用

页码：2717 / 2719

页数：3

共 14 条

[1]

CHU WK, 1991, NUCL INSTRUM METH B, V59, P1447, DOI 10.1016/0168-583X(91)95851-4

[2]

CLARK GJ, 1987, APPL PHYS LETT, V51, P39

[3] ION IRRADIATION OF EPITAXIAL YBA2CU3O7-DELTA FILMS - EFFECTS OF ELECTRONIC-ENERGY LOSS [J].