SILICON CRYOSAR AT MICROWAVE-FREQUENCIES

被引:0
作者
GLASSER, LA
KYHL, RL
机构
[1] Research Laboratory of Electronic, Massachusetts Institute of Technology, Cambridge
关键词
D O I
10.1109/T-ED.1979.19526
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Microwave and low-frequency measurements are reported on n+-v-n+ silicon cryosars fabricated with narrow intrinsic region widths. The low-frequency measurements include V-I data with and without incident microwave power. The electric field required to cause impact ionization of the donors was found to be greater than 105 V/m. The microwave measurements include a demonstration of mixing, harmonic mixing, and harmonic generation. Small-signal impedance measurements as a function of bias are reported at 1.33 and 3.05 GHz, and the diode noise temperature was measured to be 16 000 or 3000 K depending on bias polarity. Mobile electron lifetime is 10–10 s. Copyright © 1979 by The Institute of Electrical and Electronics Engineers, Inc.
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页码:966 / 970
页数:5
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