LATERAL EPITAXIAL RECRYSTALLIZATION OF DEPOSITED SILICON FILMS ON SILICON DIOXIDE

被引：16
|
作者：
KAMINS, TI [1 ]
CASS, TR [1 ]
DELLOCA, CJ [1 ]
LEE, KF [1 ]
PEASE, RFW [1 ]
GIBBONS, JF [1 ]
机构：
[1] STANFORD UNIV,STANFORD ELECTR LABS,STANFORD,CA 94305
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1981年 / 128卷 / 05期
关键词：
D O I：
10.1149/1.2127568
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
收藏
页码：1151 / 1154
页数：4
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