LASER-INDUCED CHEMICAL ETCHING OF SILICON IN CHLORINE ATMOSPHERE .3. COMBINED CW AND PULSED IRRADIATION

被引：40
|
作者：
KULLMER, R
BAUERLE, D
机构：
来源：
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | 1988年 / 47卷 / 04期
关键词：
D O I：
10.1007/BF00615502
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：377 / 386
页数：10
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