ENERGY DEPOSITION AT INSULATOR SURFACES BELOW THE ULTRAVIOLET PHOTOABLATION THRESHOLD

被引：27

作者：

DREYFUS, RW

MCDONALD, FA

VONGUTFELD, RJ

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1987年 / 5卷 / 05期

关键词：

D O I：

10.1116/1.583668

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：1521 / 1527

页数：7

共 26 条

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