EFFECT OF DONOR IMPURITIES ON THE DENSITY OF STATES NEAR THE BAND EDGE IN SILICON

被引:19
作者
BENNETT, HS
LOWNEY, JR
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10.1063/1.329497
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O59 [应用物理学];
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页码:5633 / 5642
页数:10
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共 20 条
[11]  
LOWNEY J, UNPUBLISHED
[12]   DISAPPEARANCE OF IMPURITY LEVELS IN SILICON AND GERMANIUM DUE TO SCREENING [J].
LOWNEY, JR ;
KAHN, AH ;
BLUE, JL ;
WILSON, CL .
JOURNAL OF APPLIED PHYSICS, 1981, 52 (06) :4075-4080
[13]   ENERGY-GAP IN SI AND GE - IMPURITY DEPENDENCE [J].
MAHAN, GD .
JOURNAL OF APPLIED PHYSICS, 1980, 51 (05) :2634-2646
[14]   MEASUREMENT OF THE MINORITY-CARRIER TRANSPORT PARAMETERS IN HEAVILY DOPED SILICON [J].
MERTENS, RP ;
VANMEERBERGEN, JL ;
NIJS, JF ;
VANOVERSTRAETEN, RJ .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1980, 27 (05) :949-955
[15]   MEASUREMENT OF HEAVY DOPING PARAMETERS IN SILICON BY ELECTRON-BEAM-INDUCED CURRENT [J].
POSSIN, GE ;
ADLER, MS ;
BALIGA, BJ .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1980, 27 (05) :983-990
[16]  
RODBERG LS, 1967, INTRO QUANTUM THEORY, P40
[17]  
SCHIFF LI, 1968, QUANTUM MECHANICS, P119
[18]  
WEISS PR, 1958, PHYS REV, V111, P1722
[19]  
WIEDER AW, 1978, TECH DIG IEDM DEC, P460
[20]  
ZIMAN JM, 1972, PRINCIPLES THEORY SO, P158