BONDING AND DIFFUSION AT AL AND AU INTERFACES WITH CDS

被引：38

作者：

BRILLSON, LJ ^{[1
]}

BAUER, RS ^{[1
]}

BACHRACH, RZ ^{[1
]}

MCMENAMIN, JC ^{[1
]}

机构：

[1] XEROX CORP, PALO ALTO RES CTR, PALO ALTO, CA 94305 USA

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1980年 / 17卷 / 01期

关键词：

D O I：

10.1116/1.570487

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：476 / 480

页数：5

共 21 条

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[2]

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[3]

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[4]

BAUER RS, 1978, P INT TOPICAL C SIO2

[5]

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[6] COUPLED INTERFACE PLASMONS OF AL FILMS ON CDSE AND CDS [J].

BRILLSON, LJ .

PHYSICAL REVIEW LETTERS, 1977, 38 (05) :245-248

[7] CHEMICAL-REACTIONS AND LOCAL CHARGE REDISTRIBUTION AT METAL-CDS AND CDSE INTERFACES [J].

BRILLSON, LJ .

PHYSICAL REVIEW B, 1978, 18 (06) :2431-2446

[8]

BRILLSON LJ, 1979, J VAC SCI TECHNOL, V16, P1137, DOI 10.1116/1.570177

[9] TRANSITION IN SCHOTTKY-BARRIER FORMATION WITH CHEMICAL REACTIVITY [J].

BRILLSON, LJ .

PHYSICAL REVIEW LETTERS, 1978, 40 (04) :260-263

[10] CHEMICALLY-INDUCED CHARGE REDISTRIBUTION AT AL-GAAS INTERFACES [J].

BRILLSON, LJ ;

BACHRACH, RZ ;

BAUER, RS ;

MCMENAMIN, J .

PHYSICAL REVIEW LETTERS, 1979, 42 (06) :397-401

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