FABRICATION OF MICROCHANNELS IN SYNTHETIC POLYCRYSTALLINE DIAMOND THIN-FILMS FOR HEAT SINKING APPLICATIONS

被引：10

作者：

RAMESHAM, R ^{[1
]}

ROPPEL, T ^{[1
]}

ELLIS, C ^{[1
]}

ROSE, MF ^{[1
]}

机构：

[1] AUBURN UNIV, INST SPACE POWER, AUBURN, AL 36849 USA

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1991年 / 138卷 / 06期

关键词：

D O I：

10.1149/1.2085858

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

A novel process for the formation of microchannels in polycrystalline diamond thin film on a single-crystal silicon substrate is developed using anisotropic chemical etching of silicon and selective deposition of diamond. The polycrystalline diamond thin films were grown by high-pressure microwave plasma assisted chemical vapor deposition using a gas mixture of methane and hydrogen gases. Fabrication procedure, scanning electron microscopy views of surface morphology, cross-sectional features of microchannels in polycrystalline diamond thin films, and potential applications of microchannels are reported.

引用

页码：1706 / 1709

页数：4

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