FABRICATION OF LOW-STRESS SILICON STENCIL MASKS FOR ION-BEAM LITHOGRAPHY

被引：10

作者：

SEN, S

FONG, FO

WOLFE, JC

YEN, JJ

MAUGER, P

SHIMKUNAS, AR

LOSCHNER, H

RANDALL, JN

机构：

[1] NANOSTRUCT INC,MT VIEW,CA 94043

[2] ION MICROFABRICAT SYST,A-1020 VIENNA,AUSTRIA

[3] TEXAS INSTRUMENTS INC,DALLAS,TX 75243

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1989年 / 7卷 / 06期

关键词：

D O I：

10.1116/1.584461

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：1802 / 1805

页数：4

共 12 条

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