LASER-INDUCED CHEMICAL VAPOR-DEPOSITION OF RHODIUM

We report here the laser CVD of rhodium stripes on glass substrates from volatile rhodium precursors Rh(CO)2dike, where dike = acac, thd, and hfa. Stripe dimensions, resistivities, and chemical composition were studied as functions of CW argon ion laser power, writing speed, and precursor vapor pressure. Stripe widths ranged from around fifteen up to hundreds of microns, and heights over 5-mu-m were observed. Stripe resistivities were optimal at intermediate laser powers, and ranged from 2 to 60 times that of the bulk material. The higher volatility of the hfa precursor allowed deposition to take place at room temperature.