EVAPORATION OF MACROPARTICLES IN PLASMA OF HIGH-CURRENT PULSED ARC DISCHARGE AT LOW PRESSURE

In the article, we investigate high-current regimes with initiation of cathode spots on the sputtered surface in planar magnetron sputtering system. The trials show that deposition rate depends on the discharge type in the system and this dependence in pulsed regimes is stronger than in stationary ones. The deposited coating does not contain drops of cathode material. The absence of drops is conditioned by the fact that they are evaporated under the effect of charged particle fluxes of dense plasma. The theoretical model describing possibility of evaporation or size decreasing of several sorts of particles in the plasma flux of vacuum arc is proposed. It was shown that efficiency of drop evaporation increases with increasing plasma density.