PRESENCE OF CRITICAL AU-FILM THICKNESS FOR ROOM-TEMPERATURE INTERFACIAL REACTION BETWEEN AU(FILM) AND SI(CRYSTAL SUBSTRATE)

被引：113
作者：
OKUNO, K
ITO, T
IWAMI, M
HIRAKI, A
机构：
来源：
SOLID STATE COMMUNICATIONS | 1980年 / 34卷 / 06期
关键词：
D O I：
10.1016/0038-1098(80)90659-6
中图分类号：
O469 [凝聚态物理学];
学科分类号：
070205 ;
摘要：
引用
收藏
页码：493 / 497
页数：5
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