LASER CHEMICAL VAPOR-DEPOSITION OF TI FROM TIBR4

被引：14

作者：

CHOU, WB ^{[1
]}

AZER, MN ^{[1
]}

MAZUMDER, J ^{[1
]}

机构：

[1] LASER AIDED MAT PROC LAB,DEPT MECH ENGN,URBANA,IL 61801

来源：

JOURNAL OF APPLIED PHYSICS | 1989年 / 66卷 / 01期

关键词：

D O I：

10.1063/1.343903

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：191 / 195

页数：5

共 21 条

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[9] 3-DIMENSIONAL TRANSIENT THERMAL-ANALYSIS FOR LASER CHEMICAL VAPOR-DEPOSITION ON UNIFORMLY MOVING FINITE SLABS [J].

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[10]

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