HYDROGEN-TERMINATED SILICON SUBSTRATES FOR LOW-TEMPERATURE MOLECULAR-BEAM EPITAXY

被引：91
作者：
GRUNTHANER, PJ
GRUNTHANER, FJ
FATHAUER, RW
LIN, TL
HECHT, MH
BELL, LD
KAISER, WJ
SCHOWENGERDT, FD
MAZUR, JH
机构：
[1] COLORADO SCH MINES,DEPT PHYS,GOLDEN,CO 80401
[2] UNIV SO CALIF,DEPT MAT SCI,LOS ANGELES,CA 90089
来源：
THIN SOLID FILMS | 1989年 / 183卷
关键词：
D O I：
10.1016/0040-6090(89)90445-8
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：197 / 212
页数：16
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