SYNCHROTRON X-RAY-DIFFRACTION STUDY OF SILICON DURING PULSED-LASER ANNEALING

被引：121

作者：

LARSON, BC

WHITE, CW

NOGGLE, TS

MILLS, D

机构：

[1] CORNELL UNIV,CORNELL HIGH ENERGY SYNCHROTRON SOURCE,ITHACA,NY 14850

[2] CORNELL UNIV,SCH APPL & ENGN PHYS,ITHACA,NY 14850

来源：

PHYSICAL REVIEW LETTERS | 1982年 / 48卷 / 05期

关键词：

D O I：

10.1103/PhysRevLett.48.337

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

引用

页码：337 / 340

页数：4

共 7 条

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PHYSICAL REVIEW B, 1981, 23 (06) :2923-2942

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