共 17 条
- [4] HOLLAHAN JR, 1978, THIN FILM PROCESSES, P335
- [5] PLASMA-ENHANCED CHEMICAL VAPOR-DEPOSITION OF SILICON-NITRIDE [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1992, 31 (2A): : 336 - 342
- [6] KUO Y, 1989, SPIE P DISPLAY SYSTE, V1117, P114
- [7] KUO Y, 1992, ELECTROCHEM SOC, V922, P786
- [8] KUO Y, UNPUB
- [9] KUO Y, 1992, MRS P, V282, P623
- [10] KUO Y, 1993, ELECTROCHEMICAL SOC, V932, P350