FERMI SURFACES OF TUNGSTEN SILICIDE ALLOYS

被引：10

作者：

ITOH, S

机构：

[1] Adv. Res. Lab., Toshiba Res. and Dev. Centre, Kanagawa

来源：

JOURNAL OF PHYSICS-CONDENSED MATTER | 1990年 / 2卷 / 16期

关键词：

D O I：

10.1088/0953-8984/2/16/005

中图分类号：

O469 [凝聚态物理学];

学科分类号：

070205 ;

摘要：

The Fermi surfaces of the tungsten silicide alloys WSi2 and W3Si determined from semi-relativistic self-consistent band calculation are presented. The former consists of simple closed sheets, while the latter is constructed from two closed sheets, two multiply connected surfaces and, possibly, one electron pocket. The Fermi levels of these silicides are located in the dip of the density of states. Additionally, the relationship between the content of tungsten atoms in the alloys and its electronic properties is discussed.

引用

页码：3747 / 3758

页数：12

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