MORPHOLOGIES OF STRONGLY SEGREGATED POLYSTYRENE-POLY(DIMETHYLSILOXANE) DIBLOCK COPOLYMERS

被引：59
作者：
CHU, JH [1 ]
RANGARAJAN, P [1 ]
ADAMS, JL [1 ]
REGISTER, RA [1 ]
机构：
[1] PRINCETON UNIV,DEPT CHEM ENGN,PRINCETON,NJ 08544
来源：
POLYMER | 1995年 / 36卷 / 08期
基金：
美国国家科学基金会;
关键词：
DIBLOCK COPOLYMER; POLYSTYRENE; POLY(DIMETHYLSILOXANE);
D O I：
10.1016/0032-3861(95)99001-B
中图分类号：
O63 [高分子化学（高聚物）];
学科分类号：
070305 ; 080501 ; 081704 ;
摘要：
Five polystyrene-poly(dimethylsiloxane) (PS/PDMS) diblocks were synthesized by sequential anionic polymerization, and their morphologies characterized by small-angle X-ray scattering (SAXS) and transmission electron microscopy (TEM). All materials are microphase-separate in toluene-cast films, and estimates of the interaction parameter chi indicate that these materials are all strongly segregated. The experimentally determined phase diagram is strongly skewed towards low styrene volume fractions, even more than the styrene-isoprene (SI) diblock phase diagram, even though little conformational asymmetry should exist in the PS/PDMS system. The PS/PDMS diblocks form substantially larger microdomain structures than the analogous SI diblocks, reflecting the stronger segregation strength.
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收藏
页码：1569 / 1575
页数：7
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