ROLE OF INCIDENT KINETIC-ENERGY OF ADATOMS IN THIN-FILM GROWTH

被引：100

作者：

MULLER, KH

机构：

来源：

SURFACE SCIENCE | 1987年 / 184卷 / 1-2期

关键词：

D O I：

10.1016/S0039-6028(87)80265-0

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

页码：L375 / L382

页数：8

共 10 条

[1] COLUMNAR MICROSTRUCTURE IN VAPOR-DEPOSITED THIN-FILMS [J].

DIRKS, AG ;

LEAMY, HJ .

THIN SOLID FILMS, 1977, 47 (03) :219-233

[2] ALGORITHM FOR CALCULATION OF CLASSICAL EQUATIONS OF MOTION OF AN N-BODY SYSTEM [J].

HARRISON, DE ;

GAY, WL ;

EFFRON, HM .

JOURNAL OF MATHEMATICAL PHYSICS, 1969, 10 (07) :1179-&

[3]

Leamy H. J., 1980, Current topics in materials science. Vol.6, P309

[4] THERMALIZATION OF SPUTTERED ATOMS [J].

MEYER, K ;

SCHULLER, IK ;

FALCO, CM .

JOURNAL OF APPLIED PHYSICS, 1981, 52 (09) :5803-5805

[5]

MULLER KH, UNPUB PHYS REV B

[6] ROLE OF RELAXATION IN EPITAXIAL-GROWTH - A MOLECULAR-DYNAMICS STUDY [J].

SCHNEIDER, M ;

RAHMAN, A ;

SCHULLER, IK .

PHYSICAL REVIEW LETTERS, 1985, 55 (06) :604-606

[7] MOLECULAR-DYNAMICS ON VECTOR COMPUTERS [J].

SULLIVAN, F ;

MOUNTAIN, RD ;

OCONNELL, J .

JOURNAL OF COMPUTATIONAL PHYSICS, 1985, 61 (01) :138-153

[8] INFLUENCE OF SUBSTRATE TEMPERATURE AND DEPOSITION RATE ON STRUCTURE OF THICK SPUTTERED CU COATINGS [J].

THORNTON, JA .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (04) :830-835

[9] INFLUENCE OF APPARATUS GEOMETRY AND DEPOSITION CONDITIONS ON STRUCTURE AND TOPOGRAPHY OF THICK SPUTTERED COATINGS [J].

THORNTON, JA .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1974, 11 (04) :666-670

[10] NUCLEATION AND GROWTH OF THIN-FILMS [J].

VENABLES, JA ;

SPILLER, GDT ;

HANBUCKEN, M .

REPORTS ON PROGRESS IN PHYSICS, 1984, 47 (04) :399-459

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