METALORGANIC CHEMICAL VAPOR-DEPOSITION OF BATIO3 FILMS ON MGO(100)

被引：50

作者：

NAKAZAWA, H ^{[1
]}

YAMANE, H ^{[1
]}

HIRAI, T ^{[1
]}

机构：

[1] ASAHI CHEM IND CO LTD,CORP RES LABS,KAWASAKI LAB,KAWASAKI KU,KAWASAKI 210,JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1991年 / 30卷 / 9B期

关键词：

THIN FILM; CVD; BATIO3; BETA-DIKETONE CHELATE; EPITAXIAL GROWTH; A-AXIS ORIENTATION; DIELECTRIC CONSTANT;

D O I：

10.1143/JJAP.30.2200

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

BaTiO3 thin films were prepared on MgO(100) substrates by chemical vapor deposition using barium beta-diketonate {Ba(C11H19O2)2} and titanium tetraisopropoxide {Ti[OCH(CH3)2]4} as metalorganic precursors. BaTiO3 films deposited at 800-1000-degrees-C showed prominent a-axis orientation perpendicular to the substrate surface. The deposition rate of these films was 1.0-1.2-mu-m/h. The rocking curve of BaTiO3(200) reflection from the film deposited at 800-degrees-C indicated strong crystallographic orientation. The epitaxial relationship between the film and the substrate was found by X-ray pole figure analysis. The relative dielectric constant of a polycrystalline BaTiO3 film prepared on a Pt(100)/MgO(100) substrate at 800-degrees-C was 1040 (10 kHz, 20 V/cm).

引用

页码：2200 / 2203

页数：4

共 17 条

[1] EPITAXIAL-GROWTH OF THIN-FILMS OF BATIO3 USING EXCIMER LASER ABLATION [J].

DAVIS, GM ;

GOWER, MC .

APPLIED PHYSICS LETTERS, 1989, 55 (02) :112-114

[2] AES STUDY ON THE CHEMICAL-COMPOSITION OF FERROELECTRIC BATIO3 THIN-FILMS RF SPUTTER-DEPOSITED ON SILICON [J].

DHARMADHIKARI, VS ;

GRANNEMANN, WW .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1983, 1 (02) :483-485

[3] GROWTH OF BATIO3-SRTIO3 THIN-FILMS BY RF MAGNETRON SPUTTERING [J].

FUJIMOTO, K ;

KOBAYASHI, Y ;

KUBOTA, K .

THIN SOLID FILMS, 1989, 169 (02) :249-256

[4]

FUSHIMI S, 1981, KAGAKUKOGYO, V25, P191

[5] PREPARATION OF FERROELECTRIC BATIO3 THIN-FILMS BY ACTIVATED REACTIVE EVAPORATION [J].

IIJIMA, K ;

TERASHIMA, T ;

YAMAMOTO, K ;

HIRATA, K ;

BANDO, Y .

APPLIED PHYSICS LETTERS, 1990, 56 (06) :527-529

[6]

Iijima Y., 1985, Japanese Journal of Applied Physics, Supplement, V24, P401

[7] METALORGANIC CHEMICAL VAPOR-DEPOSITION OF BATIO3 THIN-FILMS [J].

KWAK, BS ;

ZHANG, K ;

BOYD, EP ;

ERBIL, A ;

WILKENS, BJ .

JOURNAL OF APPLIED PHYSICS, 1991, 69 (02) :767-772

[8] THE EPITAXIAL VAPOR DEPOSITION OF PEROVSKITE MATERIALS [J].

MULLER, EK ;

NICHOLSON, BJ ;

TURNER, GL .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1963, 110 (09) :969-973

[9] FABRICATION OF BATIO3 FILMS BY RF PLANAR-MAGNETRON SPUTTERING [J].

NAGATOMO, T ;

KOSAKA, T ;

OMORI, S ;

OMOTO, O .

FERROELECTRICS, 1981, 37 (1-4) :681-684

[10]

NAKAZAWA H, 1991, J CERAM SOC JPN, V99, P527

← 1 2 →