HIGH-RESOLUTION FOCUSED ION-BEAM LITHOGRAPHY

被引：31
作者：
MATSUI, S
KOJIMA, Y
OCHIAI, Y
机构：
来源：
APPLIED PHYSICS LETTERS | 1988年 / 53卷 / 10期
关键词：
D O I：
10.1063/1.100098
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
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页码：868 / 870
页数：3
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