ELECTRICAL PROPERTIES OF SILICON DOPED WITH PLATINUM

被引:44
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CARCHANO, H
JUND, C
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10.1016/0038-1101(70)90012-2
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TM [电工技术]; TN [电子技术、通信技术];
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0808 ; 0809 ;
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页码:83 / &
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共 9 条
[1]  
CARLSON RE, UNPUBLISHED
[2]   ELECTRICAL PROPERTIES OF N-TYPE GERMANIUM [J].
DEBYE, PP ;
CONWELL, EM .
PHYSICAL REVIEW, 1954, 93 (04) :693-706
[3]  
GLINCHUK KD, 1965, FIZ TVERD TELA+, V6, P2963
[4]   DRIFT AND CONDUCTIVITY MOBILITY IN SILICON [J].
LUDWIG, GW ;
WATTERS, RL .
PHYSICAL REVIEW, 1956, 101 (06) :1699-1701
[5]   STATISTICS OF THE CHARGE DISTRIBUTION FOR A LOCALIZED FLAW IN A SEMICONDUCTOR [J].
SHOCKLEY, W ;
LAST, JT .
PHYSICAL REVIEW, 1957, 107 (02) :392-396
[6]  
Van der Pauw L. J., 1958, PHILIPS RES REP, V12, P1
[7]   SPIN RESONANCE OF PD AND PT IN SILICON [J].
WOODBURY, HH ;
LUDWIG, GW .
PHYSICAL REVIEW, 1962, 126 (02) :466-&
[8]  
ZIBUTS YA, 1967, FIZ TVERD TELA+, V8, P2041
[9]  
ZIBUTS YA, 1964, SOV PHYS-SOL STATE, V5, P2416