PREPARATION OF VACUUM-DEPOSITED FILMS OF RUBIDIUM SILVER-IODIDE

被引：24

作者：

KENNEDY, JH ^{[1
]}

CHEN, F ^{[1
]}

HUNTER, J ^{[1
]}

机构：

[1] UNIV CALIF,DEPT CHEM,SANTA BARBARA,CA 93106

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1973年 / 120卷 / 03期

关键词：

D O I：

10.1149/1.2403476

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：454 / 458

页数：5

共 18 条

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[7] THIN-FILM ELECTROLYTIC CELLS [J].

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[8]

NEUGEBAUER CA, 1966, 3RD P INT VAC C STUT, V1, P29

[9] HIGH CONDUCTIVITY SOLID ELECTROLYTE SYSTEM RBL-AGL [J].

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ARGUE, GR .

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[10]

OXLEY JE, 1971, 7 P INT S RES DEV NO, P535

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