MODELING OF CHARGE-INJECTION EFFECTS IN METAL-OXIDE-SEMICONDUCTOR STRUCTURES

被引：24
作者：
AVNI, E
SHAPPIR, J
机构：
来源：
JOURNAL OF APPLIED PHYSICS | 1988年 / 64卷 / 02期
关键词：
D O I：
10.1063/1.341942
中图分类号：
O59 [应用物理学];
学科分类号：
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页码：734 / 742
页数：9
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