MAIN REACTIONS OF CHLORINE-CONTAINING AND SILICON-CONTAINING ELECTRON AND DEEP-UV (EXCIMER LASER) NEGATIVE RESISTS

被引：0
作者：
TAGAWA, S
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来源：
ACS SYMPOSIUM SERIES | 1987年 / 346卷
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O6 [化学];
学科分类号：
0703 ;
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页码：37 / 45
页数：9
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