SURFACE OXIDATION-KINETICS OF SPUTTERING TARGETS

被引：43

作者：

MANIV, S ^{[1
]}

WESTWOOD, WD ^{[1
]}

机构：

[1] BELL NO RES, OTTAWA K1Y 4H7, ONTARIO, CANADA

来源：

SURFACE SCIENCE | 1980年 / 100卷 / 01期

关键词：

D O I：

10.1016/0039-6028(80)90447-1

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

页码：108 / 118

页数：11

共 8 条

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[6] DISCHARGE CHARACTERISTICS FOR MAGNETRON SPUTTERING OF AL IN AR AND AR-O-2 MIXTURES [J].

MANIV, S ;

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JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1980, 17 (03) :743-751

[7] OXIDATION OF AN ALUMINUM MAGNETRON SPUTTERING TARGET IN AR-O2 MIXTURES [J].

MANIV, S ;

WESTWOOD, WD .

JOURNAL OF APPLIED PHYSICS, 1980, 51 (01) :718-725

[8] SPECTROSCOPIC INVESTIGATION OF REACTIVE SPUTTERING OF ALUMINIUM [J].

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WESTWOOD, WD .

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