COPPER CORROSION WITH AND WITHOUT INHIBITORS

被引:299
作者
BRUSIC, V
FRISCH, MA
ELDRIDGE, BN
NOVAK, FP
KAUFMAN, FB
RUSH, BM
FRANKEL, GS
机构
[1] IBM Research Division, T.J. Watson Research Center, Yorktown Heights
关键词
D O I
10.1149/1.2085957
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
The utility of copper interconnects may ultimately depend on the ability to protect copper from corrosion. We have studied the capacity of 1H-benzotriazole (1H-BTA) to provide a protective and stable surface film able to withstand harsh chemical and thermal environments. The film was characterized with electrochemical techniques, in situ ellipsometry, ex situ time-of-flight static secondary ion mass spectrometry, high-temperature mass spectrometry, and accelerated temperature and humidity tests. Several important passivating film properties (thickness, degree of polymerization, thermal stability, corrosion resistance) depend critically on the details of the film preparation conditions. The best corrosion protection is offered by the thin film formed on an oxidized Cu surface. This film has also shown the slowest growth kinetics and the highest degree of polymerization in the Cu-BTA structure.
引用
收藏
页码:2253 / 2259
页数:7
相关论文
共 24 条