FIELD INDUCED COALESCENCE IN THIN METAL FILMS

被引：8

作者：

AHILEA, E

HIRSCH, AA

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1969年 / 6卷 / 04期

关键词：

D O I：

10.1116/1.1315733

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：698 / &

共 12 条

[1] INFLUENCE OF ELECTRIC FIELD ON GROWTH OF THIN METAL FILMS [J].

CHOPRA, KL .

JOURNAL OF APPLIED PHYSICS, 1966, 37 (06) :2249-&

[2] ELECTRICAL CONDUCTANCE OF THIN ULTRAHIGH-VACUUM-EVAPORATED FILMS OF TUNGSTEN ON GLASS [J].

DOBSON, PJ ;

HOPKINS, BJ .

JOURNAL OF APPLIED PHYSICS, 1968, 39 (07) :3074-&

[3] POSSIBLE INFLUENCE OF ELECTRIC CHARGE EFFECTS ON INITIAL GROWTH PROCESSES OCCURRING DURING VAPOR DEPOSITION OF METAL FILMS ONTO SUBSTRATES INSIDE ELECTRON MICROSCOPE [J].

DOVE, DB .

JOURNAL OF APPLIED PHYSICS, 1964, 35 (09) :2785-&

[4] ELECTRICAL CONDUCTION IN DISCONTINUOUS THIN METAL FILMS [J].

HARTMAN, TE .

JOURNAL OF APPLIED PHYSICS, 1963, 34 (04) :943-&

[5] ELECTRICAL CONDUCTION BETWEEN METALLIC MICROPARTICLES [J].

HERMAN, DS ;

RHODIN, TN .

JOURNAL OF APPLIED PHYSICS, 1966, 37 (04) :1594-&

[6] MAGNETIC ANISOTROPY INDUCED BY AN ELECTRIC FIELD [J].

HIRSCH, AA ;

AHILEA, E ;

FRIEDMAN, N .

PHYSICS LETTERS A, 1969, A 28 (11) :763-&

[7] EFFECT OF FREQUENCY ON ELECTRICAL RESISTIVITY OF GRANULAR METAL FILMS [J].

HIRSCH, AA ;

BAZIAN, S ;

FRIEDMAN, N .

VACUUM, 1964, 14 (10) :393-&

[8]

KLIPPING G, 1965, CRYOGENICS, V5, P65

[9] ELECTRICAL CONDUCTION MECHANISM IN ULTRATHIN, EVAPORATED METAL FILMS [J].

NEUGEBAUER, CA ;

WEBB, MB .

JOURNAL OF APPLIED PHYSICS, 1962, 33 (01) :74-&

[10]

VANITTERBEEK A, 1960, 10 P INT C REFR COP, V1, P80

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