DAMAGE PROFILE DETERMINATION OF ION-IMPLANTED SI LAYERS BY ELLIPSOMETRY

被引：20

作者：

MOTOOKA, T

WATANABE, K

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1980年 / 51卷 / 08期

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D O I：

10.1063/1.328231

中图分类号：

O59 [应用物理学];

学科分类号：

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页码：4125 / 4129

页数：5

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