共 50 条
- [21] Partial annealing of defects in boron-implanted p-type silicon by hydrogen implantation DEFECT AND IMPURITY ENGINEERED SEMICONDUCTORS AND DEVICES III, 2002, 719 : 341 - 346
- [22] ACCUMULATION AND ANNEALING OF MAIN COMPENSATING RADIATION DEFECTS IN P-TYPE SI-GE SOVIET PHYSICS SEMICONDUCTORS-USSR, 1989, 23 (08): : 925 - 927
- [23] Formation and annealing of radiation defects in tin-doped p-type germanium crystals Semiconductors, 2012, 46 : 611 - 614
- [25] IMPURITY CONDUCTION IN P-TYPE SILICON AT MICROWAVE FREQUENCIES PHYSICAL REVIEW, 1963, 132 (04): : 1516 - &
- [27] GALVANOMAGNETIC EFFECTS IN P-TYPE SILICON - APPLICATION TO ELECTRICALLY ACTIVE IMPURITY CONTENTS PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1978, 50 (02): : 399 - 409
- [29] IMPURITY ABSORPTION OF SUBMILLIMETER RADIATION BY P-TYPE CDSB SOVIET PHYSICS SEMICONDUCTORS-USSR, 1972, 5 (08): : 1460 - &
- [30] INJECTION ANNEALING OF RADIATION DEFECTS FORMED IN P-TYPE SILICON SUBJECTED TO AN ELECTRIC-FIELD AT 78-330-K SOVIET PHYSICS SEMICONDUCTORS-USSR, 1986, 20 (04): : 467 - 468