HIGHLY SELECTIVE EXCITATION OF ATOMS AND MOLECULES USING 2-PHOTON PROCESSES

被引：22

作者：

KELLEY, PL

KILDAL, H

SCHLOSSBERG, HR

机构：

[1] MIT, LINCOLN LAB, LEXINGTON, MA 02173 USA

[2] USAF, CAMBRIDGE RES LABS, BEDFORD, MA 01730 USA

来源：

CHEMICAL PHYSICS LETTERS | 1974年 / 27卷 / 01期

关键词：

D O I：

10.1016/0009-2614(74)80444-6

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

页码：62 / 66

页数：5

共 19 条

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