INSTRUMENTAL ASPECTS OF SECONDARY ION MASS-SPECTROMETRY AND SECONDARY ION IMAGING MASS-SPECTROMETRY

被引：20

作者：

WERNER, HW ^{[1
]}

机构：

[1] PHILIPS RES LABS,EINDHOVEN,NETHERLANDS

来源：

关键词：

D O I：

10.1016/0042-207X(72)90037-1

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：613 / 617

页数：5

共 12 条

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[2] UNTERSUCHUNGEN ZUM SPEKTRUM UND DEN ANFANGSENERGIEN NEGATIVER SEKUNDARIONEN
BENNINGHOVEN, A
[J]. ZEITSCHRIFT FUR PHYSIK, 1967, 199 (01): : 141 - +
[3] OBSERVATION ON SURFACE-REACTIONS WITH STATIC METHOD OF SECONDARY ION MASS-SPECTROMETRY .1. METHOD
BENNINGHOVEN, A
[J]. SURFACE SCIENCE, 1971, 28 (02) : 541 - +
[4] BESKE HE, 1966, THESIS U MAINZ
[5] Castaing R., 1962, J MICROSCOPIE, V1, P395
[6] ION SOURCE FOR MASS SPECTROGRAPHY
HERZOG, RFK
VIEHBOCK, FP
[J]. PHYSICAL REVIEW, 1949, 76 (06): : 855 - 856
[7] HERZOG RFK, 1967, 15 ANN C MASS SPECTR, P301
[8] HONIG RE, 1959, ADV MASS SPECTROM, P162
[9] SPUTTERING ION SOURCE FOR SOLIDS
LIEBL, HJ
HERZOG, RFK
[J]. JOURNAL OF APPLIED PHYSICS, 1963, 34 (09) : 2893 - &
[10] ROUBEROL JM, 1968, 5 P INT C XRAY OPT M