X-ray emission in a small plasma focus operating with H(2)-Ar mixtures

被引：32

作者：

Favre, M. ^{[1
]}

Lee, S.

Moo, S. P.

Wong, C. S.

机构：

[1] IPT Univ Malaya, Dept Phys, Plasma Res Lab, Kuala Lumpur 59100, Malaysia

来源：

PLASMA SOURCES SCIENCE & TECHNOLOGY | 1992年 / 1卷 / 02期

关键词：

D O I：

10.1088/0963-0252/1/2/008

中图分类号：

O35 [流体力学]; O53 [等离子体物理学];

学科分类号：

070204 ; 080103 ; 080704 ;

摘要：

The temporal and spatial characteristics of the x-ray emission in a 3 kJ plasma focus are investigated when operating in H(2) with an Ar admixture. The experiments are performed in a UNU/ICTP PFF device. The x-ray emission is detected with a multichannel system of PIN-Si diodes with different filtering looking axially and radially into the focusing region. Two main periods are observed in the x-ray emission, corresponding to two successive compressions in the focus. X-ray emission arising from electron beam activity and dense plasmas is identified. On the basis of the x-ray emission characteristics several features of the plasma focus dynamics are discussed.

引用

页码：122 / 125

页数：4

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