RAPID ELECTRON-BEAM ANNEALING OF TANTALUM FILMS ON SILICON

被引：3

作者：

MAHMOOD, F ^{[1
]}

CHEEMA, OS ^{[1
]}

WILLIAMS, DA ^{[1
]}

MCMAHON, RA ^{[1
]}

AHMED, H ^{[1
]}

SULEMAN, M ^{[1
]}

机构：

[1] UNIV PUNJAB,CTR SOLID STATE PHYS,LAHORE 20,PAKISTAN

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1990年 / 8卷 / 04期

关键词：

D O I：

10.1116/1.585030

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：630 / 634

页数：5

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