SELECTIVE DEPOSITION OF DIAMOND CRYSTALS BY CHEMICAL VAPOR-DEPOSITION USING A TUNGSTEN-FILAMENT METHOD

被引：105
|
作者：
HIRABAYASHI, K [1 ]
TANIGUCHI, Y [1 ]
TAKAMATSU, O [1 ]
IKEDA, T [1 ]
IKOMA, K [1 ]
IWASAKIKURIHARA, N [1 ]
机构：
[1] CANON INC,RES CTR,ATSUGI,KANAGAWA 24301,JAPAN
来源：
APPLIED PHYSICS LETTERS | 1988年 / 53卷 / 19期
关键词：
D O I：
10.1063/1.99789
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：1815 / 1817
页数：3
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