共 17 条
[1]
ANGUS JC, 1988, PLASMA DEPOSITED THI
[2]
ELECTRON-CYCLOTRON RESONANCE MICROWAVE DISCHARGES FOR ETCHING AND THIN-FILM DEPOSITION
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS,
1989, 7 (03)
:883-893
[3]
Chapman B., 1980, GLOW DISCHARGE PROCE
[4]
COBURN JW, 1986, PLASMA PROCESSING, V68
[5]
EHLEMAN U, 1989, THESIS RUHR U BOCHUM
[6]
ION ENERGETICS IN ELECTRON-CYCLOTRON RESONANCE DISCHARGES
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS,
1990, 8 (05)
:3720-3725
[7]
CHARGED-PARTICLE DENSITIES AND ENERGY-DISTRIBUTIONS IN A MULTIPOLAR ELECTRON-CYCLOTRON RESONANT PLASMA-ETCHING SOURCE
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS,
1990, 8 (04)
:3103-3112
[8]
ADDITIONAL BIAS EFFECTS ON THE FORMATION OF AMORPHOUS HYDROGENATED CARBON-FILMS BY ECR
[J].
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS,
1990, 29 (07)
:L1203-L1205
[10]
MAGNETIC-FIELD GRADIENT EFFECTS ON ION ENERGY FOR ELECTRON-CYCLOTRON RESONANCE MICROWAVE PLASMA STREAM
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A,
1988, 6 (01)
:25-29