ULTRAHIGH RESOLUTION POSITIVE WORKING PHOTORESIST FOR HALF-MICRON PHOTOLITHOGRAPHY

被引：0
|
作者：
SATOH, Y
KOHARA, H
TOKUTAKE, N
TAKAHASHI, K
NAKAYAMA, T
机构：
来源：
ADVANCES IN RESIST TECHNOLOGY AND PROCESSING VI | 1989年 / 1086卷
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中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
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页码：352 / 356
页数：5
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