ULTRAHIGH RESOLUTION POSITIVE WORKING PHOTORESIST FOR HALF-MICRON PHOTOLITHOGRAPHY

被引：0

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作者：

SATOH, Y

KOHARA, H

TOKUTAKE, N

TAKAHASHI, K

NAKAYAMA, T

机构：

来源：

ADVANCES IN RESIST TECHNOLOGY AND PROCESSING VI | 1989年 / 1086卷

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中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

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页码：352 / 356

页数：5

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