HYDRATION OF SPUTTER-DEPOSITED ALUMINA FILM

被引：0

作者：

KAWABE, T ^{[1
]}

HANAZONO, M ^{[1
]}

SONO, Y ^{[1
]}

WAKI, M ^{[1
]}

HARA, S ^{[1
]}

机构：

[1] HITACHI LTD,HITACHI RES LAB,HITACHI,IBARAKI 31912,JAPAN

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1987年 / 134卷 / 8B期

关键词：

D O I：

暂无

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：C431 / C431

页数：1

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