HYDRATION OF SPUTTER-DEPOSITED ALUMINA FILM

被引:0
作者
KAWABE, T [1 ]
HANAZONO, M [1 ]
SONO, Y [1 ]
WAKI, M [1 ]
HARA, S [1 ]
机构
[1] HITACHI LTD,HITACHI RES LAB,HITACHI,IBARAKI 31912,JAPAN
关键词
D O I
暂无
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
引用
收藏
页码:C431 / C431
页数:1
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