A NEW ROUTE FOR THE DEPOSITION OF SIO2 SOL-GEL COATINGS

被引：27

作者：

MARAGE, P

LANGLET, M

JOUBERT, JC

机构：

[1] INPG-ENSPG, Laboratoire des Matériaux et du Génie Physique, URA 1109 CNRS, 38402 Saint Martin d'Hères

来源：

THIN SOLID FILMS | 1994年 / 238卷 / 02期

关键词：

D O I：

10.1016/0040-6090(94)90059-0

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The ultrasonic pulverization of an aerosol offers an attractive alternative for the deposition of sol-gel thin films. Accurate control of the deposition device temperature and of the solvent vapour partial pressure during aerosol transport and deposition allows the deposition of a very large range of tetraethylorthosilicate-water-HCl-ethano solutions. The influence of the solution composition and of the post-deposition treatment on density and purity of the annealed SiO2 films is discussed. The influence of ultrasonication on the chemical properties of the source solutions is also contemplated. Fourier transform IR spectroscopy, spectroscopic ellipsometry and viscosity measurements have been used for characterizations.

引用

页码：218 / 227

页数：10

共 36 条

[1] SOL-GEL KINETICS .1. FUNCTIONAL-GROUP KINETICS [J].