PROPERTIES OF (FE,CO)-(TA,W) AMORPHOUS ALLOY-FILMS DEPOSITED BY RF SPUTTERING

被引:31
作者
NAOE, M
KODAIRA, M
HOSHI, Y
YAMANAKA, S
机构
关键词
D O I
10.1109/TMAG.1981.1061595
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
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页码:3062 / 3064
页数:3
相关论文
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