HIGH-COERCIVITY CO/PD MULTILAYER FILMS BY HEAVY INERT-GAS SPUTTERING

被引:16
作者
BRUCKER, CF
机构
[1] Mass Memory-Research Laboratories, Eastman Kodak Company, Rochester
关键词
D O I
10.1063/1.350047
中图分类号
O59 [应用物理学];
学科分类号
摘要
Co/Pd multilayer thin films with enhanced coercivity have been prepared by sputter deposition in Kr or Xe instead of Ar. The roughly twofold increase in coercivity is thought to be due to suppression of energetic sputtering species by the heavier inert gases, resulting in reduced damage to the metastable Co/Pd interface. High coercivity is achieved at practical sputtering pressures, broadening the range of magneto-optical recording applications that can be addressed using the new class of Co/Pd and Co/Pt multilayer materials.
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页码:6065 / 6067
页数:3
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