RHEED STUDIES OF INITIAL STAGES OF OXIDATION OF TUNGSTEN

被引：13

作者：

LEE, AE

SINGER, KE

机构：

来源：

JOURNAL OF CRYSTAL GROWTH | 1971年 / 9卷 / 01期

关键词：

D O I：

10.1016/0022-0248(71)90209-0

中图分类号：

O7 [晶体学];

学科分类号：

0702 ; 070205 ; 0703 ; 080501 ;

摘要：

引用

页码：68 / &

共 13 条

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ANDERSON, J ;

DANFORTH, WE .

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[2] REACTIONS OF OXYGEN WITH PURE TUNGSTEN AND TUNGSTEN CONTAINING CARBON [J].

BECKER, JA ;

BECKER, EJ ;

BRANDES, RG .

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[3] The structure of some metallic deposits on a copper single crystal as determined by electron-diffraction [J].

Cochrane, W .

PROCEEDINGS OF THE PHYSICAL SOCIETY, 1936, 48 :723-735

[4] DIFFRACTION STUDY OF OXYGEN ADSORPTION ON A (110) TUNGSTEN FACE [J].

GERMER, LH ;

MAY, JW .

SURFACE SCIENCE, 1966, 4 (04) :452-&

[5]

GORODESTSKII DA, 1967, UKR FIZ ZH, V12, P1001

[6] KINETICS OF THE OXIDATION OF PURE TUNGSTEN FROM 500-DEGREES-C TO 1300-DEGREES-C [J].

GULBRANSEN, EA ;

ANDREW, KF .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1960, 107 (07) :619-628

[7] A COMBINED LOW ENERGY AND REFLECTION HIGH ENERGY ELECTRON DIFFRACTION APPARATUS [J].

HEPPELL, TA .

JOURNAL OF SCIENTIFIC INSTRUMENTS, 1967, 44 (09) :686-&

[8] THE STRUCTURE OF OXIDE LAYERS ON TUNGSTEN [J].

KELLETT, EA ;

ROGERS, SE .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1963, 110 (06) :502-504

[9]

Kofstad P., 1966, HIGH TEMPERATURE OXI

[10]

LEE AE, P NEVAC S SOLID VACU

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