DIRECT ANALYSIS OF COMPACT SAMPLES USING THE HIGH-POWER ICP EMISSION SPECTROMETRY

The introduction of sample vapour into the torch of the high power nitrogen/argon ICP system is described. The vapour can be produced by using a simple flow chamber containing an electrode gap. In case of metallic samples or briquetted mixtures of Cu powder and oxides a point-to-plane technique with a graphite counter electrode is used. Oxidic materials are put into a graphite cup-electrode. An interrupted arc is producing the vapour which is transported by the Ar carrier gas flow into the torch. Many elements can be determined directly without a special sample preparation. Because there is no necessity to dilute samples, by a fusion or dissolution procedure for example, the total sensitivity of the ICP method can be used for analytical problems. © 1979 Springer-Verlag.