CORRELATION BETWEEN ELECTRICAL-PROPERTIES AND AES CONCENTRATION-DEPTH PROFILES OF NICR THIN-FILMS

被引：23
作者：
HOFMANN, S
ZALAR, A
机构：
[1] HAX PLANCK INST MET FORSCH, INST WERKSTOFF WISSENSCH, D-7000 STUTTGART 1, GERMANY
[2] INST ELECTR & VACUUM TECHN, LJUBLJANA, YUGOSLAVIA
来源：
THIN SOLID FILMS | 1976年 / 39卷 / DEC期
关键词：
D O I：
10.1016/0040-6090(76)90639-8
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：219 / 225
页数：7
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