PHOTODEPOSITION RATES OF METAL FROM METAL ALKYLS

被引：33

作者：

KRCHNAVEK, RR ^{[1
]}

GILGEN, HH ^{[1
]}

CHEN, JC ^{[1
]}

SHAW, PS ^{[1
]}

LICATA, TJ ^{[1
]}

OSGOOD, RM ^{[1
]}

机构：

[1] COLUMBIA UNIV,MICROELECTR SCI LABS,NEW YORK,NY 10027

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1987年 / 5卷 / 01期

关键词：

D O I：

10.1116/1.583866

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：20 / 26

页数：7

共 21 条

[1]

BAUREK D, 1984, SPRINGER SERIES CHEM

[2] STIMULATED SURFACE-PLASMA-WAVE SCATTERING AND GROWTH OF A PERIODIC STRUCTURE IN LASER-PHOTODEPOSITED METAL-FILMS [J].

BRUECK, SRJ ;

EHRLICH, DJ .

PHYSICAL REVIEW LETTERS, 1982, 48 (24) :1678-1681

[3] A SPECTROSCOPIC STUDY OF THE EXCITED-STATES OF DIMETHYLZINC, DIMETHYLCADMIUM, AND DIMETHYLMERCURY [J].

CHEN, CJ ;

OSGOOD, RM .

JOURNAL OF CHEMICAL PHYSICS, 1984, 81 (01) :327-334

[4] MEASUREMENT OF THE ELECTRONIC-SPECTRA OF PHYSISORBED MOLECULAR LAYERS [J].

CHEN, CJ ;

OSGOOD, RM .

CHEMICAL PHYSICS LETTERS, 1983, 98 (04) :363-368

[5]

CHEN CJ, 1986, UNPUB JUN C LAS EL S

[6] PHOTODEPOSITION OF METAL-FILMS WITH ULTRAVIOLET-LASER LIGHT [J].

EHRLICH, DJ ;

OSGOOD, RM ;

DEUTSCH, TF .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1982, 21 (01) :23-32

[7] UV PHOTOLYSIS OF VANDERWAALS MOLECULAR FILMS [J].

EHRLICH, DJ ;

OSGOOD, RM .

CHEMICAL PHYSICS LETTERS, 1981, 79 (02) :381-388

[8] LASER MICROPHOTOCHEMISTRY FOR USE IN SOLID-STATE ELECTRONICS [J].

EHRLICH, DJ ;

OSGOOD, RM ;

DEUTSCH, TF .

IEEE JOURNAL OF QUANTUM ELECTRONICS, 1980, 16 (11) :1233-1243

[9] LASER PHOTOCHEMICAL MICROALLOYING FOR ETCHING OF ALUMINUM THIN-FILMS [J].

EHRLICH, DJ ;

OSGOOD, RM ;

DEUTSCH, TF .

APPLIED PHYSICS LETTERS, 1981, 38 (06) :399-401

[10]

EHRLICH DJ, 1983, SPRINGER SERIES CHEM

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